BEDE PLC

Short profile:

Business site of Bede

Keywords:

45nm, 65nm, 90nm, advanced logic, atomic scale metrology, backside defects inspection, bare substrate, barrier layer, barrier metal, barrier metal structure, bede, bevel defects inspection, bevel edge defect, bicmos, composition, compressive stress, copper, cops, crystal phase, crystal texture, dislocation pileups, dram, dual damascene, edge inspection, engineered substrate, etch stop, epitaxial sige, flash memory, gate dielectric, grain size, hbt, hemt, high k, high resolution x ray diffraction, high throughput semiconductor manufacturing, hole mobility, hrxrd, inspection, interconnect, lattice mismatch, low k, metal gate, metrology, mim capacitors, mosfets, mram, nanolaminates, non destructive x ray metrology, ohmic contact, pattern recognition software, porosity, porous low k ild, preferred orientation, recess depth, relaxation, semiconductor material composition, semiconductor process control, semiconductor quality assurance, semiconductor quality control

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